Home/ Products / Silicon Carbide Wafer (SiC Wafer) / 4H Semi-Insulating Type
Specification
Item 4H Semi-Insulating SiC substrate
Diameter 100±0.3mm
Thickness 150±25μm,350±25μm,500±25μm,1000±25μm
Surface Orientation <0001> ± 0.2°
Primary Flat Orientation <11-20> ± 5.0°
Primary Flat Length 32.5±2.0mm
Secondary Flat Orientation Silicon face up: 90° CW. from Primary flat±5.0°
Secondary Flat Length 18.0±2.0mm
Resistivity ≥1E7 Ω·cm
Front Surface Finish Si-Face: CMP, Ra<0.5nm
Back Surface Finish C-Face: Optical Polish, Ra<1.0nm
Laser Mark Back side: C-Face
TTV ≤15μm
BOW ≤30μm
WARP ≤40μm
Edge Exclusion ≤3 mm


Customization specifications:
* Various sizes and shapes such as 10*10mm

* Various thicknesses: 0.1~20mm

* Various orientations such as Off-Axis:8°toward <11-20>±0.5°

* Various surface roughness such as slicing,lapping,polishing.

* Silicon carbide crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=3.076Å c=10.053Å
Density(g/cm³) 3.21
Melting point(℃) 2830
Mohs Hardness(mohs) 9.2
Dielectric Constant 9.66
Band Gap(eV) 3.26
Breakdown Electrical Field (MV/cm) 3.1
Thermal Conductivity(W/cm·K) 4.5
Thermal Expansion 4.7*10⁻⁶/K
Refractive Index 2.6767 ~ 2.6480
SKU: --
4 inch silicon carbide wafer (4H-Semi-Insulating type, double side polished)
Thickness
  • 150μm
  • 350μm
  • 500μm
  • 1000μm
Pieces
  • 1pcs
  • 10pcs
  • 25pcs
Stock: 119999988
Quantity
$0.00 ~ 1,200.00

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DESCRIPTION
SiC substrate material is the core and basic material for preparing power semiconductor devices.Due to its excellent physical properties such as high temperature resistance, high pressure resistance,high working frequency and high thermal conductivity,SiC can effectively reduce device volume, increase power density, simplify system, and improve performance. Currently, it has been widely applied in the field of new energy, which is represented by the EV industry. JXT has n-type SiC substrates and semi-insulating type SiC substrates, if you need, contact us!
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