Home/ Products / Sapphire Substrate Wafer / PSS/NPSS Sapphire Substrate
Specification
Item Patterned Sapphire Substrate
Diameter 100.0±0.2mm
Thickness 650±25μm
Surface Orientation C-M plane 0.2°
Primary Flat Orientation A-Plane (11-20) ± 1.0°
Primary Flat Length 30.0±1.0mm
Front Surface Finish Patterned
Back Surface Finish Single side polished
Laser Mark Back side
TTV ≤10μm
BOW ≤15μm
WARP ≤20μm
Edge Exclusion ≤3 mm
Pattern Specification Shape Structure Dome, Cone,Pyramid
Pattern Height 1.6~1.8μm
Pattern Diameter 2.75~2.85μm
Pattern Space 0.1~0.3μm
Pattern Micrographs Pattern Micrographs


Customization specifications:

* Nanometer patterned sapphire substrate(NPSS).

* Sapphire PSS of various orientations.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=4.76Å c=12.99Å
Density(g/cm³) 3.98
Melting point (℃) 2040
Mohs Hardness(mohs) 9
Dielectric Constant 9.3(A plane)
11.5(C plane)
Thermal Conductivity(W/cm·K) 0.46
Thermal Expansion 6.7*10⁻⁶/k(C plane)    5.0*10⁻⁶/k(A plane)
Refractive Index 1.762-1.777
Transmission Test sample:Sapphire: D76.2*4mm
UV:200~380nm  74%~84%
Visible light: 380~760nm  85%
Infrared: 760~1000nm  85%
Far-Infrared: >1000nm  80%~100%
SKU: --
4 inch Patterned Sapphire Substrate (PSS)
Thickness
  • 650μm
Pieces
  • 1pcs
  • 25pcs
  • 100pcs
Surface
  • SSP
Stock: 2999997
Quantity
$20.00 ~ 50.00

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DESCRIPTION
4-inch high-purity C-plane monocrystalline sapphire substrate with precisely fabricated periodic micro/nano patterns. Manufactured via advanced lithography and dry etching processes with excellent pattern uniformity and high surface cleanliness. The patterned structure effectively reduces threading dislocation density of GaN epitaxial layers, suppresses total internal reflection, and significantly improves light extraction efficiency and luminous performance. Widely used for high-power LEDs, high-brightness blue/green LEDs, Mini-LED, backlight display and mass optoelectronic production. Custom pattern shape, pitch and etching depth are available.
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