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Specification
Item Nano-Patterned Sapphire Substrate
Diameter 100.0±0.2mm
Thickness 430±25μm
Surface Orientation C-M plane 0.2°
Primary Flat Orientation A-Plane (11-20) ± 1.0°
Primary Flat Length 30.0±1.0mm
Front Surface Finish Patterned
Back Surface Finish Single side polished
Laser Mark Back side
TTV ≤10μm
BOW ≤15μm
WARP ≤20μm
Edge Exclusion ≤3 mm
Pattern Specification Shape Structure Hexagonal Array
Pattern Type V500 V600 V700
Pattern Diameter 400-550nm 550-650nm 650-750nm
Pattern Height 250-450nm 250-450nm 250-450nm
Pattern Pitch 1000nm 1000nm 1000nm
Pattern Specification Pattern Type V800 V900 Λ700
Pattern Diameter 750-850nm 850-950nm 600-800nm
Pattern Height 350-550nm 350-550nm 350-550nm
Pattern Pitch 1000nm 1000nm 1000nm
Pattern Micrographs
     (1)Hexagonal array       (2)Convex Pattern       (3)Concave Pattern


Customization specifications:

* Nanometer patterned sapphire substrate(NPSS).

* Sapphire PSS of various orientations.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=4.76Å c=12.99Å
Density(g/cm³) 3.98
Melting point (℃) 2040
Mohs Hardness(mohs) 9
Dielectric Constant 9.3(A plane)
11.5(C plane)
Thermal Conductivity(W/cm·K) 0.46
Thermal Expansion 6.7*10⁻⁶/k(C plane)    5.0*10⁻⁶/k(A plane)
Refractive Index 1.762-1.777
Transmission Test sample:Sapphire: D76.2*4mm
UV:200~380nm  74%~84%
Visible light: 380~760nm  85%
Infrared: 760~1000nm  85%
Far-Infrared: >1000nm  80%~100%
SKU: --
4 inch Nano-Patterned Sapphire Substrate NPSS(D500/D600/D700/D800/D900)
Thickness
  • 430μm
Pieces
  • 1pcs
  • 25pcs
  • 100pcs
Surface
  • SSP
Stock: 2999999997
Quantity
$100.00 ~ 200.00

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DESCRIPTION
High‑purity C‑plane monocrystalline sapphire substrate equipped with ultra‑fine periodic nano‑scale patterns. Fabricated by advanced nanoimprint lithography and precision dry etching processes, featuring ultra‑uniform nanostructure distribution and ultra‑low surface defects. Compared with traditional micro‑PSS, NPSS further optimizes GaN lateral overgrowth, minimizes threading dislocation density, and dramatically enhances light extraction efficiency by 10%–20%. Ideal for high‑efficiency LED chips, deep‑UV optoelectronic devices, high‑end Mini/Micro‑LED displays and advanced epitaxy R&D. Custom nano pattern size, pitch and depth are available.
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