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Specification
1.Epitaxial Parameters




2.Epitaxial Parameters

 
Layer Thickness
AlN 500nm
Buffer ~
Sapphire Substrate 430±25μm

3. Substrate Parameters

Substrate: Sapphire substrate C-plane
Substrate Diameter: 50.8±0.1mm
Substrate Surface: Single side polished or Double side polished


4. Reference:

2"/3"/4"/6" sapphire substrate is available
RMS(AFM)<1nm
Thickness uniformity < 10%
A/R/M-Plane and C off-cut M/A 0~10°sapphires are available.
Single and double side polished sapphires are available.

Epitaxial structure and substrate specifications can be customized, anna@jxtwafer.com,shirley@jxtwafer.com
SKU: --
2 inch AlN on Sapphire Epitaxial Wafer
Thickness
  • 430μm
Pieces
  • 1pcs
  • 10pcs
  • 50pcs
Surface
  • SSP
  • DSP
Epitaxial layer thickness
  • 500nm
Stock: 59999994
Quantity
$0.00 ~ 500.00

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DESCRIPTION
2‑inch AlN on Sapphire Epitaxial Wafer (AlN template) is high‑quality undoped aluminum‑nitride thin‑film epitaxially grown on C‑plane sapphire substrate. Featuring wide band‑gap, excellent ultraviolet transparency, high thermal conductivity, low defect density and epi‑ready ultra‑smooth surface, it serves as an ideal template for subsequent AlGaN / GaN epitaxy. Widely applied in DUV‑LED, UV laser, high‑frequency RF‑HEMT and nitride‑based semiconductor research. Custom AlN film thickness, surface roughness and cleaning grade are available upon request.
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