Home/ Products / Sapphire Substrate Wafer / Off-axis Sapphire Substrate
Specification
Item Sapphire Substrate
Diameter 50.8±0.1mm
Thickness 430±25μm
Surface Orientation A-M plane 7° OR R-M plane 3°
Primary Flat Orientation A-plane ± 0.3°
Primary Flat Length 16.0±1.0mm
Surface Finish Single side polished
Laser Mark Back side
TTV ≤8μm
BOW ≤10μm
WARP ≤12μm
Edge Exclusion ≤3 mm


Customization specifications:

* Various orientations such as A/R/M/N Plane, C off M(1°-10°), C off A(1°-10°).

* Various sizes and shapes such as 10*10mm,12inch

* Various thicknesses: 0.1~20mm

* Various surface roughness such as slicing,lapping,polishing.

* Sapphire crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=4.76Å c=12.99Å
Density(g/cm³) 3.98
Melting point (℃) 2040
Mohs Hardness(mohs) 9
Dielectric Constant 9.3(A plane)
11.5(C plane)
Thermal Conductivity(W/cm·K) 0.46
Thermal Expansion 6.7*10⁻⁶/k(C plane)    5.0*10⁻⁶/k(A plane)
Refractive Index 1.762-1.777
Transmission Test sample:Sapphire: D76.2*4mm
UV:200~380nm  74%~84%
Visible light: 380~760nm  85%
Infrared: 760~1000nm  85%
Far-Infrared: >1000nm  80%~100%
SKU: --
2 inch A-M plane 7° / R-M plane 3° Sapphire Substrate (Single side polished)
Thickness
  • 430μm
Pieces
  • 1pcs
  • 25pcs
  • 100pcs
Surface
  • SSP
Stock: 2999997
Quantity
$40.00 ~ 100.00

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DESCRIPTION
High‑purity monocrystalline sapphire (Al₂O₃). Two custom‑off‑axis specifications: A‑plane (11‑20) substrate with 7° miscut towards M‑axis (10‑10), R‑plane (1‑102) substrate with 3° miscut towards M‑axis (10‑10). Epi‑ready polished surface with precise control over miscut tolerance, TTV, bow, warp and surface roughness. This research‑grade off‑cut wafer delivers tailored atomic‑step structure, well suited for non‑polar and semi‑polar GaN/AlN epitaxy, polarization‑related optoelectronic‑device research, piezoelectric‑film deposition and hetero‑epitaxy mechanism study. Single‑side / double‑side polishing and customized thickness are available.
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