Home/ Products / Silicon Carbide Wafer (SiC Wafer) / 6H-P/6H-N/3C-N/4H-P Type
Specification
Item 4H-P type SiC substrate
Diameter 50.8±0.3mm
Thickness 350±25μm
Surface Orientation Off-Axis: 4° toward <11-20>±0.5°
Primary Flat Orientation Parallel to <10-20>±5°
Primary Flat Length 16.0±1.5mm
Secondary Flat Orientation Silicon face up: 90° CW. from Primary flat±5.0°
Secondary Flat Length 8.0±1.5mm
Resistivity 0.1-0.5Ω·cm
Surface Finish DSP
Laser Mark Back side: C-Face
TTV ≤10μm
BOW ≤25μm
WARP ≤30μm
Edge Exclusion ≤3 mm


Customization specifications:
* Various sizes and shapes such as 10*10mm

* Various thicknesses: 0.1~20mm

* Various orientations such as Off-Axis:8°toward <11-20>±0.5°

* Various surface roughness such as slicing,lapping,polishing.

* Silicon carbide crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=3.076Å c=10.053Å
Density(g/cm³) 3.21
Melting point(℃) 2830
Mohs Hardness(mohs) 9.2
Dielectric Constant 9.66
Band Gap(eV) 3.26
Breakdown Electrical Field (MV/cm) 3.1
Thermal Conductivity(W/cm·K) 4.5
Thermal Expansion 4.7*10⁻⁶/K
Refractive Index 2.6767 ~ 2.6480
SKU: --
2 inch 4H-P type silicon carbide wafer
Thickness
  • 350μm
Pieces
  • 1pcs
  • 10pcs
  • 25pcs
Stock: 29999997
Quantity
$0.00 ~ 1,000.00

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DESCRIPTION
2 inch 4H-P type silicon carbide wafer achieves stable P-type conductivity with aluminum doping. 4H-SiC features great carrier mobility suitable for power device manufacturing. CMP polishing guarantees flat surface and controllable defects, matching MOCVD epitaxy. With high temperature resistance, good thermal conductivity, corrosion and radiation resistance, the wafer is widely used in optoelectronic components, high-temperature microelectronics and laboratory research. Custom thickness and resistivity are offered for samples and bulk purchases.
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