Home/ Products / Silicon Carbide Wafer (SiC Wafer) / 6H-P/6H-N/3C-N/4H-P Type
Specification
Item 4H-P type SiC substrate
Size 10*10mm
Thickness 350±25μm
Resistivity 0.1-0.5Ω·cm
Surface Finish Double Side Polished
Laser Mark Back side: C-Face


Customization specifications:
* Various sizes and shapes such as 5*5mm,10*10mm

* Various thicknesses: 0.1~20mm

* Various orientations such as Off-Axis:8°toward <11-20>±0.5°

* Various surface roughness such as slicing,lapping,polishing.

* Silicon carbide crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=3.076Å c=10.053Å
Density(g/cm³) 3.21
Melting point(℃) 2830
Mohs Hardness(mohs) 9.2
Dielectric Constant 9.66
Band Gap(eV) 3.26
Breakdown Electrical Field (MV/cm) 3.1
Thermal Conductivity(W/cm·K) 4.5
Thermal Expansion 4.7*10⁻⁶/K
Refractive Index 2.6767 ~ 2.6480
SKU: --
10*10mm 4H-P type silicon carbide wafer
Thickness
  • 350μm
Pieces
  • 1pcs
  • 10pcs
  • 25pcs
Stock: 29999997
Quantity
$0.00 ~ 5,000.00

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DESCRIPTION
Our 10×10 mm 4H‑P‑type monocrystalline silicon carbide wafer is premium small‑size polished SiC substrate. Thanks to stable p‑type doping, excellent hole mobility and superior high‑voltage, high‑temperature endurance, the wafer suits laboratory epitaxial tests, material characterization and prototype power‑optoelectronic device research. Custom surface‑finish specifications are supported.
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