Home/ Products / Silicon Carbide Wafer (SiC Wafer) / 6H-P/6H-N/3C-N/4H-P Type
Specification
Item 3C-N type SiC substrate
Diameter 50.8±0.3mm
Thickness 350±25μm
Surface Orientation Off-Axis: 4° toward <11-20>±0.5°
Primary Flat Orientation Parallel to <10-20>±5°
Primary Flat Length 16.0±1.5mm
Secondary Flat Orientation Silicon face up: 90° CW. from Primary flat±5.0°
Secondary Flat Length 8.0±1.5mm
Resistivity ≤0.8Ω·cm
Surface Finish DSP
Laser Mark Back side: C-Face
TTV ≤10μm
BOW ≤25μm
WARP ≤30μm
Edge Exclusion ≤3 mm


Customization specifications:
* Various sizes and shapes such as 10*10mm

* Various thicknesses: 0.1~20mm

* Various orientations such as Off-Axis:8°toward <11-20>±0.5°

* Various surface roughness such as slicing,lapping,polishing.

* Silicon carbide crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=3.076Å c=10.053Å
Density(g/cm³) 3.21
Melting point(℃) 2830
Mohs Hardness(mohs) 9.2
Dielectric Constant 9.66
Band Gap(eV) 3.26
Breakdown Electrical Field (MV/cm) 3.1
Thermal Conductivity(W/cm·K) 4.5
Thermal Expansion 4.7*10⁻⁶/K
Refractive Index 2.6767 ~ 2.6480
SKU: --
2 inch 3C-N type silicon carbide wafer
Thickness
  • 350μm
Pieces
  • 1pcs
  • 10pcs
  • 25pcs
Stock: 29999997
Quantity
$0.00 ~ 1,000.00

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DESCRIPTION
Our 2 inch 3C‑N type silicon‑carbide wafer is nitrogen‑doped cubic‑phase single‑crystal substrate with <111> crystal‑orientation. Featuring high‑speed electron mobility, low tunnel‑leakage current and few crystal defects, this conductive SiC substrate excels for epitaxy growth, high‑frequency RF components, high‑speed power chips, high‑temperature sensors and optoelectronic‑device research.
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