Home/ Products / Silicon Carbide Wafer (SiC Wafer) / 6H-P/6H-N/3C-N/4H-P Type
Specification
Item 3C-N type SiC substrate
Size 10*10mm
Thickness 350±25μm
Resistivity ≤0.8Ω·cm
Surface Finish Double Side Polished
Laser Mark Back side: C-Face


Customization specifications:
* Various sizes and shapes such as 5*5mm,10*10mm

* Various thicknesses: 0.1~20mm

* Various orientations such as Off-Axis:8°toward <11-20>±0.5°

* Various surface roughness such as slicing,lapping,polishing.

* Silicon carbide crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=3.076Å c=10.053Å
Density(g/cm³) 3.21
Melting point(℃) 2830
Mohs Hardness(mohs) 9.2
Dielectric Constant 9.66
Band Gap(eV) 3.26
Breakdown Electrical Field (MV/cm) 3.1
Thermal Conductivity(W/cm·K) 4.5
Thermal Expansion 4.7*10⁻⁶/K
Refractive Index 2.6767 ~ 2.6480
SKU: --
10*10mm 3C-N type silicon carbide wafer
Thickness
  • 350μm
Pieces
  • 1pcs
  • 10pcs
  • 25pcs
Stock: 29999997
Quantity
$0.00 ~ 500.00

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DESCRIPTION

Our 10*10 mm 3C‑N‑type monocrystalline silicon‑carbide wafer is nitrogen‑doped cubic‑phase SiC substrate with standard <111> crystal orientation.

Boasting high electron mobility, low tunneling leakage current and low‑density crystal defects, this small‑size SiC specimen is ideal for laboratory‑scale epitaxial growth, material characterization, prototype device fabrication, high‑temperature sensor, optoelectronic component and‑RF‑related research.

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