Home/ Products / Silicon Carbide Wafer (SiC Wafer) / 6H-P/6H-N/3C-N/4H-P Type
Specification
Item 4H-P type SiC substrate
Diameter 150±0.3mm
Thickness 350±25μm
Surface Orientation Off-Axis: 4° toward <11-20>±0.5°
Primary Flat Orientation Parallel to <10-20>±5°
Primary Flat Length 32.5±1.5mm
Secondary Flat Orientation Silicon face up: 90° CW. from Primary flat±5.0°
Secondary Flat Length 18.0±1.5mm
Resistivity 0.1-0.5Ω·cm
Surface Finish DSP
Laser Mark Back side: C-Face
TTV ≤10μm
BOW ≤25μm
WARP ≤30μm
Edge Exclusion ≤3 mm


Customization specifications:
* Various sizes and shapes such as 10*10mm

* Various thicknesses: 0.1~20mm

* Various orientations such as Off-Axis:8°toward <11-20>±0.5°

* Various surface roughness such as slicing,lapping,polishing.

* Silicon carbide crystal ingots are available.


Properties
Crystal Structure Hexagonal
Lattice Constant(nm) α=3.076Å c=10.053Å
Density(g/cm³) 3.21
Melting point(℃) 2830
Mohs Hardness(mohs) 9.2
Dielectric Constant 9.66
Band Gap(eV) 3.26
Breakdown Electrical Field (MV/cm) 3.1
Thermal Conductivity(W/cm·K) 4.5
Thermal Expansion 4.7*10⁻⁶/K
Refractive Index 2.6767 ~ 2.6480
SKU: --
6 inch 4H-P type silicon carbide wafer
Thickness
  • 350μm
Pieces
  • 1pcs
  • 10pcs
  • 25pcs
Stock: 29999997
Quantity
$0.00 ~ 5,000.00

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DESCRIPTION
Our 6‑inch 4H‑P‑type silicon carbide wafer is premium‑grade monocrystalline SiC substrate finished with precise lapping, polishing and ultra‑clean surface treatment. Featuring stable p‑type doping, outstanding high‑voltage endurance and excellent high‑temperature‑resistant property, this epi‑ready wafer suits SiC‑IGBT, optoelectronic components and power‑device manufacturing. Custom‑tailored thickness, surface finish and resistivity specifications are available for mass‑production and laboratory‑level demands.
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